Semiconductor
Silicon Wafer
Precision Optics - Technical Glass
Flat Panel Display
Ophthalmic
Flat Glass & Mirror
Solar Industry

Certified By: ISO 9001:2015
Silicon Wafer

Post-Polish Cleaning

Post-polish cleaning is an essential step in the wafer manufacturing process. Polishing is performed with a polishing pad and a slurry comprised of very fine silica particles suspended in a liquid and adjusted with a caustic to a desired pH.  The balance of the abrasive effect of the particles and the etching effect of the caustic leaves a perfect, defect-free surface.  However, residual contaminants do remain on the surface and must be removed via a rinse and PVA brush cleaning process.  Intersurface Dynamics manufactures detergents specifically formulated to enhance the effectiveness of this brush cleaning process for optimum contaminant removal.



Vector HTC-SCA Series
ULTRASONIC/MEGASONIC DETERGENTS








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